Enrollment & Fees

Students from any institution may attend the Wasatch-Uinta Digital Capstone course. In 2024 the Applied Digital Capstone course will be offered through the University of Illinois - Urbana Champaign. Tuition for non-consortium students is the same as for in-state students enrolled in a 3 credit online course ($1272+ fees at 2024 tuition rates). Interested students should email Dr. Nooreen Meghani with any questions but also to allow us to keep track of all the interested students prior to the registration dates

Prerequisites

Structural Geology (or equivalent), History of the Earth System (or equivalent) or Sedimentology and Stratigraphy (or equivalent), and one additional 400-level geology course, or permission of the instructor.

Enrolling as a Non-Degree Seeking Student

Enrollment opens at 8 am CST on April 15th, 2024. All external (students not at UIUC) digital capstone students will enroll as non-degree seeking students at the University of Illinois. Before continuing, please visit the following web page at the Center for Innovation in Teaching & Learning (CITL) and review the enrollment and course registration process. When finished, please click the button below to enroll.

Pre-Camp Survey

Once you have decided to enroll in the Digital Camp and have communicated with an instructor, please complete the following survey to help us better understand your current access to technology. This survey will collect a range of information regrading the technology you have access to, including the type of computer you use, how much RAM that computer has, if you have access to a printer, and the quality of your Internet service. The survey will also inquire about your location (time zone), other responsibilities you will have during the camp period (e.g., other classes, work, caretaker, etc.), and give you an opportunity to send instructors any questions or comments you might have. You may want to complete the answers to these questions before beginning the survey and cut/past them into spaces provided.